Micro-machining technology not only has high requirements for equipment and processing conditions, but also has high requirements for processing capabilities. In addition, some unconventional micro-nano device processing has been monopolized by foreign countries for a long time, resulting in the development of related industries has been controlled by others. Based on breaking the foreign technology blockade and realizing domestic technological innovation, the existing equipment and processing conditions can meet the customization needs of DOE, GPOE, ROE and MLA products. The following micro-nano devices can be processed according to customer requirements and the above process route: ring optical shaper, vortex Waveplate, homogenizer, micro-Lens, Laser diffuser, liquid crystal components, super-structured surface, etc.

DOE class custom product overview

Diffractive Optical Element(DOE) (Diffractive Optical Elements, DOE) is an optical element based on the principle of light diffraction, which regulates the Phase and Amplitude of light wavefront through micro-nano structures. Its core is the use of micron or sub-micron structure design, beam shaping, beam splitting, focusing and other complex functions. DOE achieves precise manipulation of light waves through micro-nano structures, and its design combines Wave Optics theory and computational optimization algorithms, and its processing relies on high-precision lithography and etching technology.

Main application scenarios

· ring optical shaper, point ring optical shaper, adjustable point ring optical shaper

· spiral Phase plate

· plate flat top light shaper, focusing type flat top light shaper

· diffraction Cone Lens

Product Features

according to customer needs, we accurately design and manufacture components for different functions such as beam shaping, beam splitting, focusing, etc., to achieve flat-top, ring and other light spots and array beam splitting effects. In the design, with the help of advanced algorithms and simulation software, full consideration of Wavelength, beam parameters, etc., to ensure component performance. When processing, lithography, etching, nanoimprint and other technologies are used to control micron-level to nanometer-level accuracy to meet the customization needs of various fields from scientific research to industrial production.